Silicon wafer 3inch N Type 1~00Ω Oxide Layer Semiconductor Substrate
Silicon wafer 3inch N Type 1~00Ω Oxide Layer Semiconductor Substrate
Silicon wafer 3inch N Type 1~00Ω Oxide Layer Semiconductor Substrate

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Silicon wafer 3inch N Type 1~00Ω Oxide Layer Semiconductor Substrate

Sale price$18.90 USD
Number Of Items:1 Item
Specification:N(100) Oxide Layer280nm
Quantity:

♦️High-quality silicon wafer for Research and Experiment.
♦️Provide small quantities, special specifications products, and customized services.
Silicon Wafer Specification:
  • Size: 3inch;
  • Method: CZ;
  • Type: N;
  • Dopant: P;
  • Orientation:100;
  • Resistivity: 1~10Ω;
  • Thickness: 500um±25;
  • Oxide layer: 280nm(both sides);
  • TTV<10um ;
  • Surface: polished;
  • Backside: etched;
  • Packing: silicon wafer case;